of Environmental Sciences, Rolling Meadows, IL The advancing needs of nanoscale processes are reflected in recent low-threshold Generic Vibration Curves (Figure 3)- a serious challenge to site engineers.įigure 3: New, more stringent Generic Vibration Curves. (Images obtained via SEM.)įigure 2: Settling time in response to on-board disturbance such as substrate loading greatly improved by STACIS’ novel “serial” design, helping cycle rates meet exponentiating throughput demands. (Right): STACIS isolation enables crisp, accurate photolithography. (Left): Pattern is obliterated by floor vibration. By comparison, STACIS provides aggressive attenuation starting at sub-Hz levels and is more than 100 times stiffer, directly benefiting settling.įigure 1: 45nm line-width test patterns produced with an advanced Immersion Lithography System at SEMATECH in Austin, TX 2. Ambient ground motion can obliterate ever-finer pattern details (Figure 1), and conventional soft isolators do not isolate vibrations below 2Hz and do a poor job of responding to onboard vibration driven by rapid processing (Figure 2). This pushes substrate sizes up and cycle time downs, both of which are at cross purposes to the exponentiating resolutions required.Ĭlearly, yesterday’s vibration isolation techniques are inadequate for tomorrow’s (or even today’s) nanoscale processes. Together, these describe a challenge for process engineers and researchers alike: the tractability of nanoscale processes worsens with relentlessly diminishing scale, yet the process must be economical. Meanwhile, Equation 2, defines a term describing nanoscale processing in the face of the fundamental economic constraint of “time is money.”Įquation 2: The economic imperative of “time is money” necessitates more devices per cm 2, larger area processing, and faster cycle times. Moore’s Law, Equation 1, describes the exponentiating density of integrated circuit elements with time.Įquation 1: Moore’s Law observes a doubling of device density every 18 months. The semiconductor industry is ruled by two unbreakable laws. Vibration and Throughput: The Yield-Killers This technology is now also available in small form-factors ideal for emerging applications ranging from advanced microscopies to nanomanufacturing Based on digital signal processing algorithms and responsive piezo technology with the latest ultra-reliability enhancements, patented i STACIS active isolators have proven their dependability in mission-critical fab deployment for over a decade. Wes Wigglesworth, Technical Manufacturing Corporation Scott Jordan, PI (Physik Instrumente) L.P.Īctive vibration isolation technology is a key ingredient for enabling next-generation, 22nm scale lithography. Piezo-Driven Active Vibration Control Pushes Limits of Nano-Scale Imaging/Fabrication
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